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We would like to thank Wenli Collison, Tom Ni, and David Hemker of
LAM Research for providing the plasma etch data and for
discussions on change-point detection in plasma etch processes.
The research described in this paper was supported by NSF CAREER
award IRI-9703120 and by the NIST Advanced Technology Program and
KLA-Tencor.
Xianping Ge
2000-05-16